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Multiple patterning
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#	Item
11	Designing with FinFETs Evolution or Revolution GSA meeting Jamil Kawa Jan 23, 2013 Add to Reading List Source URL: www.gsaglobal.org Language: English - Date: 2014-01-22 10:43:55 Electronic engineering Technology MOSFET Synopsys Silicon-germanium Transistor Chemistry Multigate device Multiple patterning
12	PDF Document Add to Reading List Source URL: www.spie.org Language: English - Date: 2015-03-18 09:28:34 The Mask SPIE Photomask Extreme ultraviolet lithography Multiple patterning Photolithography Mask inspection Mask shop KLA Tencor Materials science Microtechnology Technology
13	Extreme Ultraviolet Lithography: Towards the Next Generation of Integrated Circuits THE VIEWPOINT - Optical lattice solitons: Guiding and routing light at will Add to Reading List Source URL: opfocus.org Language: English - Date: 2010-03-11 13:42:27 Extreme ultraviolet lithography Multiple patterning Immersion lithography Photolithography Extreme ultraviolet Photoresist 11 nanometer X-ray lithography ASML Holding Microtechnology Materials science Technology
14	Production Technologies for Mass-production Pioneering Development of Immersion Lithography UCHIYAMA Takayuki Abstract NEC Electronics has pioneered the development of the immersion lithography technology in order to de Add to Reading List Source URL: www.nec.com Language: English - Date: 2012-09-11 09:28:37 Extreme ultraviolet lithography Multiple patterning Resist Semiconductor device fabrication Lithography 32 nanometer Solid immersion lens Photolithography Stepper Materials science Technology Immersion lithography
15	PHABLE-R exposure tool The PHABLE-R exposure tool has been developed for research labs and for product development. This unique system enables our customers to produce various periodic structures with the convenience the Add to Reading List Source URL: www.eulitha.com Language: English - Date: 2014-05-05 05:09:27 Microtechnology Photolithography Photoresist Photomask Resist Wafer Photonic crystal Multiple patterning Extreme ultraviolet lithography Materials science Semiconductor device fabrication Chemistry
16	Microsoft PowerPoint - ad-fieldingmfg[removed]Compatibility Mode] Add to Reading List Source URL: www.lec.ethz.ch Language: English - Date: 2014-08-15 04:24:00 Microtechnology Extreme ultraviolet lithography Extreme ultraviolet Photolithography Multiple patterning Photomask Semiconductor device fabrication Ultraviolet Abstract State Machine Language Materials science Technology Electromagnetic radiation
17	Increased demand for faster, smaller, low-power chips continues to drive the geometry shrink as one of the ways to manage the low-power, higher performance goals in smaller form factor. 40nm chips are state-of-the-art, 3 Add to Reading List Source URL: www.cadence.com Language: English - Date: 2012-07-23 18:26:39 Physical design Multiple patterning Design closure Cadence Design Systems Design flow Placement Standard cell Routing Nanoroute Electronic engineering Electronic design automation Signoff
18	Taming the Challenges of 20nm Custom/Analog Design Custom and analog designers will lay the foundation for 20nm IC design. However, they face many challenges that arise from manufacturing complexity. The solution lies no Add to Reading List Source URL: www.cadence.com Language: English - Date: 2012-11-09 18:02:00 Integrated circuits Electronic design Signoff Standard cell Integrated circuit design Application-specific integrated circuit Cadence Design Systems Multiple patterning Design rule checking Electronic engineering Electronics Electronic design automation
19	SURFACE AND INTERFACE DYNAMICS IN MULTILAYERED SYSTEMS Ph.D. committee Chair: prof. dr. ir. B. Poelsema Secretary: Add to Reading List Source URL: doc.utwente.nl Language: English - Date: 2011-08-28 11:51:47 Multiple patterning Extreme ultraviolet Next-generation lithography Optical coating Photolithography Ultraviolet 11 nanometer Electromagnetic radiation Materials science Extreme ultraviolet lithography
20	Datasheet Sentaurus Lithography Predictive Modeling of Lithographic Processes Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:17 Computational lithography Extreme ultraviolet lithography Multiple patterning Photolithography Immersion lithography Optical proximity correction Resist Lithography Electron beam lithography Microtechnology Materials science Technology

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